| Customization: | Available |
|---|---|
| Application: | Lab |
| Customized: | Non-Customized |
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| Model: | GSL1100X-SPC16C Sputtering Evaporate Carbon Instrument |
| Brief Introduction: |
GSL1100X-SPC16C Sputtering Evaporate Carbon Instrument is a CE certified machine, can be used for plasma sputtering coating film and evaporate carbon coating film. It can not only be used for plasma sputtering coating the metal film, and can obtain the carbon thin film through the evaporating. GSL1100X-SPC16C is designed basic on dipolar (DC)sputtering principle, it's a sample, reliable, low cost coating equipment. Add a heating evaporate attachment at the same time, have two functions of sputtering and evaporating. Suit for manufacture scanning electron microscope(SEM)sample in the laboratory, also can make the non-conductor material testing electrode. GSL1100X-SPC16C can research the performance various new materials. |
| Main Feature: | GSL1100X-SPC16C accessories is based on GSL-1100X-SPC-16,Add a heating evaporate attachment at the same time, have two functions of sputtering and evaporating. Therefore, to expand the application, especially for manufacturing the scanning electron microscope laboratory sample. |
| Technical Parameter: |
1. Vacuum sample room:Pyrex glass 160mm×110mm(D×H) 2. Target(upper electrode): 50mm×0.1mm(D×H) 3. Sample holder:50mm(D) 4. Vacuum operation:4×10-1mbar to 2×10-2mbar 5. Working voltage:0-1600V (DC)adjustable 6. Sputtering current:0-50mA 7. Sputtering timer:1-9999S 8. Evaporate carbon current: 0-10A(AC) 9. Vacuum pump:4L two-step mechanical rotary pump(Ultimate vacuum 2×10-2mbar) |
| Optional Accessories : |
Target:Au, In, Ag, Pt and all kinds of materials. |
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